ウルチクリーン・エクセラーER・KC product photo Primary L

ウルチクリーン・エクセラーER・KC

The UltiKleen Excellar ER filters show enhanced retention (ER) and improved non-dewetting properties over previous designs. These properties enable semiconductor makers to meet the chemical process filtration requirements of the 22 nanometer manufacturing node and beyond. The smaller format assemblies are designed for critical single-pass, point-of-use retention. The filter's high flow rate also makes it suitable for recirculation bath applications.

KC disposable assemblies are available with ten inch nominal, (254 mm) filters for higher flow rates.1 The shorter UltiKleen Excellar ER KC assemblies shown here are ideally suited for lower flow point-of-use and single wafer tool applications.

Features

  • Provided fully prewet as standard
  • Me-KleenSM option for ultra low metal ion extractables
  • 100% Integrity tested
  • Proprietary non-dewetting surface
  • Choice of connection sizes

Benefits

  • No need to prewet and flush for safe quick start
  • Reduced qualification time in critical clean processes
  • Assured filter integrity
  • Filter resists drying in outgassing chemistries or after chemical changes
  • Sizes to fit existing connections


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概要
The UltiKleen Excellar ER filters show enhanced retention (ER) and improved non-dewetting properties over previous designs. These properties enable semiconductor makers to meet the chemical process filtration requirements of the 22 nanometer manufacturing node and beyond. The smaller format assemblies are designed for critical single-pass, point-of-use retention. The filter's high flow rate also makes it suitable for recirculation bath applications.

KC disposable assemblies are available with ten inch nominal, (254 mm) filters for higher flow rates.1 The shorter UltiKleen Excellar ER KC assemblies shown here are ideally suited for lower flow point-of-use and single wafer tool applications.

Features

  • Provided fully prewet as standard
  • Me-KleenSM option for ultra low metal ion extractables
  • 100% Integrity tested
  • Proprietary non-dewetting surface
  • Choice of connection sizes

Benefits

  • No need to prewet and flush for safe quick start
  • Reduced qualification time in critical clean processes
  • Assured filter integrity
  • Filter resists drying in outgassing chemistries or after chemical changes
  • Sizes to fit existing connections
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仕様

Materials of Construction

 
Filter Medium PTFE
Capsule, core, cage, and end caps Filter support and drainage Sealing method High purity PFA PTFE Proprietary melt seal process
Removal Rating 20 nm, 15 nm
Filter Area 0.9 m2 / 9.7 ft2
Maximum Operating Temperature 170 °C / 338 °F
Maximun forward / reverse differential pressure (gauge)2 0.5 MPa (71 psi) @ 25 °C (77 °F)
0.4 MPa (57 psi) @ 60 °C (140 °F)
0.35 MPa (49 psi) @ 90 °C (194 °F)
0.2 MPa (29 psi) @ 120 °C (248 °F)
0.15 MPa (22 psi) @ 150 °C (302 °F)
0.12 MPa (17 psi) @ 170 °C (338 °F)
 
1See bulletins MEUKG2EREN
2Reverse pressure is not recommended during normal operation
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性能

Pressure Drop vs. Liquid Flow Rate (Water, 20 °C)3 Clean

Graphic 1
3Typical flow rates.
For liquids other than water, multiply the differential pressure by fluid viscosity in centipoise.
Unit conversion: 1 bar = 0.1 MPa
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製品タイプ
カプセル
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製品使用分野
ろ過
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追加情報

Dimensions

Dimensions
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産業分野
Semiconductor
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アプリケーション
Chemicals
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産業分野
半導体